Electron glass effects in amorphous NbSi films
Julien Delahaye, Thierry Grenet, Claire A Marrache-Kikuchi, Vincent Humbert, Laurent Bergé, Louis Dumoulin
SciPost Phys. 8, 056 (2020) · published 9 April 2020
- doi: 10.21468/SciPostPhys.8.4.056
We report on non equilibrium field effect in insulating amorphous NbSi thin films having different Nb contents and thicknesses. The hallmark of an electron glass, namely the logarithmic growth of a memory dip in conductance versus gate voltage curves, is observed in all the films after a cooling from room temperature to 4.2 K. A very rich phenomenology is demonstrated. While the memory dip width is found to strongly vary with the film parameters, as was also observed in amorphous indium oxide films, screening lengths and temperature dependence of the dynamics are closer to what is observed in granular Al films. Our results demonstrate that the differentiation between continuous and discontinuous systems is not relevant to understand the discrepancies reported between various systems in the electron glass features. We suggest instead that they are not of fundamental nature and stem from differences in the protocols used and in the electrical inhomogeneity length scales within each material.
Cited by 3
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Sharma et al., Optimization of Coulomb glass system using quenching and annealing at small disorders
0, (2023) [Crossref]
Delahaye et al., Electron glass signatures up to room temperature in disordered insulators
J. Phys.: Condens. Matter 34, 135603 (2022) [Crossref]
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- 1 Julien Delahaye,
- 1 Thierry Grenet,
- 2 Claire A. Marrache-Kikuchi,
- 2 Vincent Humbert,
- 2 Laurent Bergé,
- 2 Louis Dumoulin